Reactive Ion Etching of X-Cut LiNbO3 in an ICP/TCP System for the Fabrication of an Optical Ridge Waveguide

In this study, the technology for producing ridge waveguides with a minimal roughness of sidewalls and material surface in near-waveguide region was developed purpose fabricating miniature photonic integrated circuits on LiNbO3 substrate. Plasma etching processes were used waveguide fabrication different substrates. The specifications equipment plasma source, method mask substrate determined process conditions sidewall roughness. work, fabrication, reactive ion chromium carried out mixture SF6/Ar an ICP/TCP source. source is not well studied, especially photonics purposes. As result our experimental narrow ranges technological parameters suitable smooth sidewalls, slope angle 60°–75° quantity observed defects identified. A model explaining kinetics as physical–chemical proposed.